Tobelo by Gary Holton

By Gary Holton

Tobelo is a Papuan language spoken by means of nearly 15,000 individuals at the islands of Halmahera and Morotai within the jap Indonesian province of North Maluku. The phonemic stock of Tobelo comprises 5 vowels and twenty consonants, together with a palatal lateral, drift and nasal. Syllable constitution is usually (C)V. Roots are categorialy ambivalent and will ensue as both nouns or verbs with acceptable morphology. Verbal morphology is comparatively wealthy, together with a procedure of compulsory pronominal prefixes and non-compulsory aspectual suffixes. Nouns happen as adjuncts to pronominal arguments and are obligatorily marked through a proclitic. notice order is SOV, notwithstanding now not rigidly so. complicated verb structures are paratactic, along with a chain of verbs every one cross-referencing a number of arguments and entirely inflected for point. there is not any morphological marker of subordination and no indication of finiteness. Holton is a documentary linguist who has performed box paintings with a number of Austronesian and Papuan languages in jap Indonesia. past guides comprise an annotated bibliography of language and linguistics in Maluku and a number of other experiences of Tobelo grammar and discourse. he's at the moment assistant professor of linguistics on the Alaska local Language heart, the place he's engaged within the documentation and revitalization of Alaska Athabascan languages.

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6 Anisotropic Etched Microfabrication SiNWs Microelectromechanical systems (MEMs) technology is reaching a good level of maturity. It provides a good platform to co-fabricate nanodevices together with CMOS or IC compatible processing. This leads to potential large-scale, low-cost, orientation dependant, smaller but high-yield production of nanodevices such as SiNW field effect transistor (FET) devices. Surface and bulk micromachining play an important role in MEMS and nanofabrication. Surface micromachining builds microstructures in different layers on top of the substrate via selective etching and deposition.

79] P. R. Nair and M. A. Alam, “Design considerations of silicon nanowire biosensors,” IEEE Transactions on Electron Devices, vol. 54, pp. 3400– 3408, 2007. [80] R. J. Niklas Elfström, Ilya Sychugov, Torun Engfeldt, Amelie Eriksson Karlström, and Jan Linnros, “Surface Charge Sensitivity of Silicon Nanowires: Size Dependence,” Nano Letters, vol. 7, pp. 2608–2612, 2007. [81] B. P. , “Electrical recording from hearts with flexible nanowire device arrays,” Nano letters, vol. 9, pp. 914–918, 2009. © 2012 by Taylor & Francis Group, LLC 39 40 Fabrication of Nanowires for Biosensing Applications [82] G.

These voltage pulses will form a water meniscus and this will lead to anodic oxidation on the surface. Next, wet or dry etching is used to remove the unmasked (not covered by the oxide) region. This technique is slow and time consuming as writing per scan size is limited, due to its hardware configuration. Wafer scale writing will take longer times since AFM is not meant for large-scale scanning. 5 Deposition and Etching under Angle Another low-cost and top-down fabrication technique was introduced by Hien et al.

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